Advances in Mirror Technology for X-ray, EUV Lithography, Laser and Other Applications II 5 August, 2004, Denver, Colorado, USA
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Author Description
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Page Count:
194
Publication Date:
2004-01-01
ISBN-10:
0819454710
ISBN-13:
9780819454713
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