This volume details the fundamental processes involved in silicon wafer fabrication for Very Large Scale Integration (VLSI) circuits. It covers the critical steps from raw silicon material to polished wafers ready for device manufacturing, focusing on the chemical and physical transformations that occur.

This foundational text is regarded as a comprehensive resource for understanding the intricate processes of silicon wafer fabrication. Its detailed coverage of techniques like oxidation, photolithography, and etching makes it an invaluable reference for students and professionals in semiconductor engineering. The book is noted for its thorough explanation of the chemical and physical principles underlying each step, providing a solid theoretical basis for practical application in the VLSI era.