Author Description

Microscopy is central to the vast majority of semiconductor failure analyses, and is therefore of great importance to engineers concerned with design validation, process optimization, component qualification, testing, and pre- or post-use diagnostics. A wide range of microscopical techniques is available, and each has a unique and complementary role to play in determining the causes of semiconductor failure. The applications of microscopy to semiconductor failure analysis are described in this concise handbook, which provides a valuable practical guide for all those working in the field. The basic principles and operation of each type of microscopy are explained, and each is illustrated with case histories and micrographs of many failure mechanisms. The need for new microscopies for the study of future generation devices is discussed, and several possible candidates for this purpose are assessed.