Author Description
The Focus Of This Book Is The Remarkable Advances In Understanding Of Low Pressure Rf (radio Frequency) Glow Discharges. A Basic Analytical Theory And Plasma Physics Are Explained. Plasma Diagnostics Are Also Covered Before The Practicalities Of Etcher Use Are Explored.
Menrva's Summary
THE THESIS
This book investigates the fundamental physical mechanisms and practical applications of low-pressure radio frequency (RF) glow discharges in the context of plasma etching. The author, M. Sugawara, synthesizes complex plasma physics with industrial engineering requirements to provide a comprehensive framework for understanding how ionized gases are manipulated for material processing. By bridging the gap between theoretical discharge models and operational etcher hardware, the text establishes a systematic approach to plasma-based manufacturing.
THE SCOPE MAP
What You Will Find
- Analytical theory of low-pressure RF glow discharges
- Fundamental principles of plasma physics
- Methodologies for plasma diagnostics
- Practical operational guidelines for plasma etching equipment
Scope Limits
- Advanced non-RF plasma discharge types
- Specific proprietary industrial etcher schematics
THE AUTHORITY PERSPECTIVE
Experts recognize this work as a technical resource for engineers and students specializing in semiconductor fabrication. Readers frequently note the academic density of the prose, which requires a solid foundation in physics to fully comprehend the presented diagnostic techniques.
Page Count:
362
Publication Date:
1998-01-01
Publisher:
Oup Oxford
ISBN-10:
0191590290
ISBN-13:
9780191590290
Science
Materials Science
Plasma Physics
Engineering
Physics