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This book considers theoretical models, calculations, and computer methods for a wide variety of states and processes in different types of solids and surfaces. Topics include semiconductors and ceramic surfaces, grain boundaries, defects and impurities, and such processes as growth and catalysis. Computer simulations and calculations using parallel architectures are included. Outstanding contributions from distinguished leaders in their respective fields make this volume an excellent guide to the recent developments in modelling processes. It will be indispensable to researchers in many areas of solid materials.
This volume investigates the application of advanced theoretical models and computational methods to analyze complex physical and chemical processes occurring within solid materials and at their interfaces. The authors, A. M. Stoneham, C. R. A. Catlow, and J. M. Thomas, curate a collection of expert contributions that synthesize current research in solid-state physics and chemistry. By integrating diverse perspectives on defect structures, surface dynamics, and catalytic behavior, the text provides a comprehensive framework for understanding how computational simulations can predict material properties at the atomic and molecular levels.
What You Will Find
Experts recognize this volume as a significant compilation of research from leaders in the field of materials modeling. Researchers frequently utilize this text as a technical reference for understanding the intersection of computational chemistry and solid-state physics.
Page Count:
194
Publication Date:
1994-02-17
Publisher:
Oxford University Press
ISBN-10:
0198539886
ISBN-13:
9780198539889
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