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The book presents a detailed description of high-resolution x-ray scattering methods suitable for the investigation of the real structure of single-crystalline layers and multilayers, including structure defects in the layers and at the interfaces. Particular attention is devoted to lateral structures in semiconductors and semiconductor multilayers such as quantum wires and quantum dots. Both the theoretical background and the application of the methods are discussed. The second edition is extended to deal with lateral surface nanostructures such as gratings and dots, new examples for measuring layer thickness, lattice mismatch, and surface/interface roughness. The book will be an invaluable source for graduates and scientists.
This book details advanced high-resolution x-ray scattering techniques for analyzing the structural properties of thin films and nanostructures. It focuses on single-crystalline layers, multilayers, and their defects, with special emphasis on lateral nanostructures like quantum wires and dots in semiconductors. The text covers both the theoretical underpinnings and practical applications of these methods, making it a comprehensive resource for researchers in the field.
The second edition of this work extends its coverage to include lateral surface nanostructures, providing updated examples for critical measurements. It is presented as an invaluable resource for graduates and scientists engaged in the study of thin films and nanostructures. The detailed treatment of both theory and application suggests a text aimed at specialists seeking in-depth knowledge of x-ray scattering techniques. Its focus on advanced methods indicates a readership requiring a strong foundation in physics and materials science.
Page Count:
408
Publication Date:
2012-01-01
ISBN-10:
1441923071
ISBN-13:
9781441923073
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